Investigate at Nanoscale.

In 2004, the Nanophotonics Fabrication Laboratory was built with grants from the University of Dayton and the Ohio Third Frontier project. Nanoscale components research for telecommunications and infrared applications for commercial, military, safety and security purposes is conducted.

Central innovation: Concept to market.

RF/DC Plasma Sputter Deposition System
Torr Electron Beam Evaporator
Plasma Enhanced Chemical Vapor Deposition
Vapor Prime/Image Reversal Vacuum Oven
Megasonic Cleaning
Plasma Cleaning and Surface Activation
Mask Aligner
Spin Coater
Spray Developer
Deep-UV Laser Interference Lithography
Rapid Thermal Annealing
Contact bake station
Gravity Convection Oven
Substrate Bonding/Nano-Imprint
Polishing/Wafer Thinning
Stylus Profiler
Transmission/Reflection Spectrum
Horizontal Microscope
Optical Microscope

Courses: EOP 632/ECE 682

1. Cleanroom operations
  • Design of cleanrooms
  • Contamination control
  • Chemical safety
2. Vacuum systems and plasma processes
  • Basic kinetic theory of gases
  • Vacuum pumps
  • Vacuum measurements and diagnostics
  • Gas flow measurement
  • Basic plasma theory
  • DC, RF, parallel plate and magnetron, ICP
3. Substrate properties & preparation
  • Properties of silicon and crystal orientations
  • Quartz, fused-silica, III-V substrates
  • Wafer cleaning processes
4. Thin film deposition techniques
  • RF and DC sputter deposition
  • Filament and electron-beam evaporation
  • Plasma-enhanced chemical vapor deposition
  • Measuring and controlling film thickness
  • Film stress theory and measurement
  • Optical properties of thin films
  • Optical filter design and fabrication configurations
5. Photolithography
  • Basic photoresist chemistry
  • Dill parameters for modeling photoresists
  • Positive and negative resists and image reversal
  • Photomask design
  • Contact and projection printing techniques
  • Alignment techniques
  • Thin film lift-off techniques
  • SU8 and thick film processes
6. Plasma etching
  • Etch chemistries and thermodynamics
  • Determining etch rates, selectivity and masks
  • Plasma etching and ion beam milling
  • Inductively coupled plasma etching
  • Deep silicon etching processes
7. Wet chemical etching and bulk micromachining
  • Aniosotropic and isotropic etch chemistries
  • Bulk micromachining for MEMS devices
8. Micro-metrology
  • Surface profilometry
  • Spectrophotometry for thin film characterization
  • Scanning electron microscopy
9. CMOS technology
  • FEOL and BEOL steps
  • Damascene process
  • Foundry processes
10. Optoelectronic device fabrication
  • Integrated optical devices and waveguides
  • Photodetectors and imaging arrays

NSF Nanotechnology Grant

Linking the University of Dayton and Sinclair Community College.

We have a joint National Science Foundation (NSF) grant with Sinclair Community College to introduce nanotechnology to undergraduates and two-year colleges. Through this, we have introduced two undergraduate courses at UD (EGR-311 and EGR-411) and two courses at Sinclair.

Live Video System

We built a remote video system to link any laboratory on campus to the classroom. The system, on a cleanroom compatible mobile cart, is portable from one laboratory to another with the intent to leverage existing research laboratories, which may be located in different buildings. The laboratory codec communicates with the classroom codec through the Internet or campus intranet. The cart also has a large LCD monitor to allow the operator in the laboratory to see and interact with the classroom. Two high-definition cameras can be moved and zoomed by the laboratory operator and also by the instructor at the classroom end. The video and audio are two-way, with multiple wireless microphones at the student desks, allowing the students to interact with the laboratory instructor and the laboratory instructor to see the students in real time. 


Electro-Optics Graduate Program

Fitz Hall 572 A 
300 College Park 
Dayton, Ohio 45469 - 0232